Semiconductor & Solar >> ULTECH Co. Ltd, South Korea

Wet Etching

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    Ultech’s Wet Etching System finds application in etching:

    – Si Anisotropic Wet Etch
    – PSL, Electroplating
    – V-Groove, U-Groove, Cavity formation
    – Membrane, microchannel formation

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      Detailed Specs

      Wet Etching System can be used to etch wet anisotropic Si in bulk micromachining. Wet Etching system is designed simply and compactly. Especially the addition of the MEGAONIC holder can make the characteristics of Si etching be improved remarkably. Our system is adequate for the R&D and proto type production

      – Improving roughness of the etching
      surface using Megasonic
      – Excellent etching rate & uniformity
      – PTFE solution for bath material of
      Etching and circulation
      – KOH and TMAH for etching solution
      – Etching solution heating