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ULTECH’s wet bench is a semi-automated process tool used to carry out wet cleaning and etching operations in semiconductor manufacturing or other high technology products. They can be designed for acid or solvent processing.
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Detailed Specs
ULTECH’s Wet Bench Tool offers:
– Minimizing foot print from optimizing design in fluid tank
– Smaller usage of chemicals and pure water because of excellent design in
piping
– Easy control of temperature, flux, and mixing rate of the fluid
-Easy control and maintenance
– Available mixing of Cleaning / Chemical etching / Solvent / Developer bench
Specifications:
– Sample size & throughput : Up to 8inch, 1 cassete (25 wafers)
– Cleaning wet bench : SC-1/2, DHF, QDR, KOH, H3PO4
– Etching wet bench : DHF, Metal Etch, QDR
– Solvent wet bench : Solvent, QDR
– Developer wet bench : Developer, QDR
– Spin dry bench (option)
– Process control : Manual process control (option – PLC)