Semiconductor & Solar >> SURFACE & SURFACE systems+technology GmbH & Co. KG

Pulsed Layer Deposition(PLD)

I am interested in this product

    Your Name (required)

    Your Email (required)

    Contact Number

    Product Name

    Close Form

    Surfacetec’s Pulsed laser deposition (PLD) is a versatile process for thin film deposition with the major advantage of stoichiometric material transfer from a target to the substrate. The SURFACE Pulsed Laser Deposition (PLD)-Workstation is the excellent prototyping and research system for thin films, providing easy access to new materials and especially to advanced oxide layers.

    I am interested in this product

      Your Name (required)

      Your Email (required)

      Contact Number

      Product Name

      Close Form

      Downloads

      Detailed Specs

      Surfacetec’s Pulsed laser deposition (PLD) is a versatile process for thin film deposition with the major advantage of stoichiometric material transfer from a target to the substrate. The SURFACE Pulsed Laser Deposition (PLD)-Workstation is the excellent prototyping and research system for thin films, providing easy access to new materials and especially to advanced oxide layers. The typical features are:

      – All-in-one-frame solution for fast, “plug’n’play” installation
      – Advanced process automation, perfect also for supperlattice deposition
      – Oxygen resistant substrate heater with advanced temperature measurement, 1000°C
      – Laser heating of substrate optionally available
      – Flexible advanced target manipulator with cross-contamination shielding
      – Vacuum chamber prepared for system upgrades (RHEED, plasma sources, OES/FTIR,…)
      – SURFACE Fluence Control option, for 100% reproducible results
      – Fully enclosed beam line for hassle-free, safe operation
      – Turn-key delivery
      – Advanced online support via internet