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The PicoMaster 200 Mask Writer/Laser based Lithography tool supports wafers and substrates up to 8″ square and is a versatile UV laser writer with ultra high precision components, specifically designed to give the user the highest degree of freedom to write structures smaller then 300nm in photosensitive materials
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The rasterizing principle of the machine ensures proper and constant exposure over the whole surface. Scanning the substrate at high speed and stepping the laser head with a software adjustable pitch.
Supporting up to 4096levels of grayscale or pure binary mode allows for 3D optical structures, surface structures as well as mask projects makes the PicoMaster’s Mask Writer/Laser based Lithography tool the ideal Litho tool for R&D as well as production.
The PicoMaster is a standalone, fully enclosed system. All required components, including control rack and vacuum pump are within the enclosure, which allows for quick and easy installation.
When connected to an air conditioning unit to supply conditioned air, a build in Hepa filter will create a clean cross flow.
The massive base frame supported by isolation mounts filter out ground frequencies to ensure minimum vibrations in the system.