Electron Beam Evaporation System (E-Beam)

Nano-Master, Inc. NEE-4000 Electron Beam Evaporation Systems(E Beam) come in a dual chamber configuration consisting of the main chamber where platen is located and a secondary chamber for housing the e-beam source. This configuration with a gate valve between two chambers may be used as a load lock to keep the electron-beam (e-beam) source pockets in vacuum while substrate is loaded and unloaded from the main chamber substrate holder or platen. On other applications where automatic loading and unloading of wafers is needed, it can be achieved through a third load lock chamber that may be attached to the left face of the cube. Co-evaporation capability with multiple e-beam sources and ability to program compositions or compositional gradients through PC control can be provided.Nanomaster’s E-Beam Evaporation System offers unique features like;

– Electro-polished 14” cubical or 21”x21”x22” 304L SS chamber optimized for evaporation
– 5 x 10-7 Torr base pressure attained with turbo molecular pumping package
– 4 x 15cc pocket E-gun
– Source and substrate shutters
– 6Kw switching power supply with superior arc suppression
– Automatic pocket indexing and programmable sweep controller
– 26” x 44” footprint with enclosed panels ideal for clean rooms
– Quartz crystal thickness sensor
– Substrate rotation
– PC based fully automatic recipe or manually driven control system
– State of the art user interface
– EMO protection and safety interlocks